Appliance for monitoring of etching activation
A novel appliance for monitoring of wet chemical etch activation was developed at Saarland University. A desired final point of the etch activation (etch stop) can be determined by continual measurement during the wet chemical structure activation. The method is suitable for any plane-parallel substrates which are optically transparent in at least one partition of the spectrum. In particular, the following substrates are of great interest: Si, GaAs, SiC, GaN, Ge, silicon and other III-IV semiconductors.
Further Information: PDF
Universität des Saarlandes Wissens- und Technologietransfer GmbH PatentVerwertungsAgentur der saarländischen Hochschulen
Phone: +49 (0)681/9386340
Contact
Dipl.-Kfm. Axel Koch MBA
Media Contact
All latest news from the category: Technology Offerings
Newest articles
Trotting robots reveal emergence of animal gait transitions
A four-legged robot trained with machine learning by EPFL researchers has learned to avoid falls by spontaneously switching between walking, trotting, and pronking – a milestone for roboticists as well…
Innovation promises to prevent power pole-top fires
Engineers in Australia have found a new way to make power-pole insulators resistant to fire and electrical sparking, promising to prevent dangerous pole-top fires and reduce blackouts. Pole-top fires pose…
Possible alternative to antibiotics produced by bacteria
Antibacterial substance from staphylococci discovered with new mechanism of action against natural competitors. Many bacteria produce substances to gain an advantage over competitors in their highly competitive natural environment. Researchers…
