Silicon deposition by EBID/IBID
Vapour deposition processes permitting the deposition of layers or structures of a defined material onto substrates are frequently used for the editing of microelectronic devices, the mending of masks or in different areas of nanotechnology. The present invention provides a new procedure for the direct deposition of silicon on substrates, based on the interaction of focused particle beams with polysilane-based precursors.
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