Method of Controlling Ion Energy and Flux in Capacitively Coupled Radio Frequency Discharges
The energy of ions impacting surfaces during plasma processing is crucial in determining both
the properties of materials being deposited by plasmas and for the control of the etching of thin films. A new method that allows the ion energy and plasma density to be decoupled has been developed.
Further Information: PDF
rubitec – Gesellschaft für Innovation und Technologie der Ruhr-Universität Bochum mbH
Phone: +49 (0)234/32-11969/11950
Contact
Dietmar Tappe
Media Contact
All latest news from the category: Technology Offerings
Newest articles
Economies take off with new airports
A global study by an SUTD researcher in collaboration with scientists from Japan explores the economic benefits of airport investment in emerging economies using nighttime satellite imagery. Be it for…
CAR T–cell immunotherapy targets
Pan-cancer analysis uncovers a new class of promising CAR T–cell immunotherapy targets. Scientists at St. Jude Children’s Research Hospital found 156 potential CAR targets across the brain and solid tumors,…
Stony coral tissue loss disease
… is shifting the ecological balance of Caribbean reefs. The outbreak of a deadly disease called stony coral tissue loss disease is destroying susceptible species of coral in the Caribbean…
