Appliance for monitoring of etching activation
A novel appliance for monitoring of wet chemical etch activation was developed at Saarland University. A desired final point of the etch activation (etch stop) can be determined by continual measurement during the wet chemical structure activation. The method is suitable for any plane-parallel substrates which are optically transparent in at least one partition of the spectrum. In particular, the following substrates are of great interest: Si, GaAs, SiC, GaN, Ge, silicon and other III-IV semiconductors.
Further Information: PDF
Universität des Saarlandes Wissens- und Technologietransfer GmbH PatentVerwertungsAgentur der saarländischen Hochschulen
Phone: +49 (0)681/302-6340
Contact
Dipl. Chem. Dagmar Vössing, Dipl.-Kfm. Axel Koch MBA, Dipl. Ing. Gerd Schneider
Media Contact
All latest news from the category: Technology Offerings
Newest articles
Recovering phosphorus from sewage sludge ash
Chemical and heat treatment of sewage sludge can recover phosphorus in a process that could help address the problem of diminishing supplies of phosphorus ores. Valuable supplies of phosphorus could…
Efficient, sustainable and cost-effective hybrid energy storage system for modern power grids
EU project HyFlow: Over three years of research, the consortium of the EU project HyFlow has successfully developed a highly efficient, sustainable, and cost-effective hybrid energy storage system (HESS) that…
After 25 years, researchers uncover genetic cause of rare neurological disease
Some families call it a trial of faith. Others just call it a curse. The progressive neurological disease known as spinocerebellar ataxia 4 (SCA4) is a rare condition, but its…
