A new nanotechnology tool that will dramatically cut the cost of leading-edge nano research at the sub-50nm scale has been developed by EU researchers. It could lead to Next Generation Lithography (NGL) technology.
The commercially available first generation tool is low cost compared to sub-50nm alternatives. For example, electron beam lithography costs €2m per machine, whereas the Soft Ultraviolet (UV) Imprint machine developed by SOUVENIR project costs in its basic version well below €200,000. It will be used to produce novel and experimental nanotech devices.
"In principle, this new technique has the potential to be used for mass manufacture by the semiconductor industry. One approach we use can already form patterns down to the 10nm scale," says Dr Markus Bender, researcher at German company, Applied Micro- and Optoelectronics (AMO), and SOUVENIR coordinator.
Tara Morris | alfa
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