Technology Offerings

Silicon Deposition Techniques: Exploring EBID and IBID Methods

Vapour deposition processes permitting the deposition of layers or structures of a defined material onto substrates are frequently used for the editing of microelectronic devices, the mending of masks or in different areas of nanotechnology. The present invention provides a new procedure for the direct deposition of silicon on substrates, based on the interaction of focused particle beams with polysilane-based precursors.

Further Information: PDF

INNOVECTIS Gesellschaft für Innovations-Dienstleistungen mbH
Phone: +49 (0)69/2561632-0

Contact
Dr. Otmar Schöller

Comments (0)

Write a comment