Silicon deposition by EBID/IBID
Vapour deposition processes permitting the deposition of layers or structures of a defined material onto substrates are frequently used for the editing of microelectronic devices, the mending of masks or in different areas of nanotechnology. The present invention provides a new procedure for the direct deposition of silicon on substrates, based on the interaction of focused particle beams with polysilane-based precursors.
Further Information: PDF
INNOVECTIS Gesellschaft für Innovations-Dienstleistungen mbH
Phone: +49 (0)69/2561632-0
Contact
Dr. Otmar Schöller
Media Contact
All latest news from the category: Technology Offerings
Newest articles
Recovering phosphorus from sewage sludge ash
Chemical and heat treatment of sewage sludge can recover phosphorus in a process that could help address the problem of diminishing supplies of phosphorus ores. Valuable supplies of phosphorus could…
Efficient, sustainable and cost-effective hybrid energy storage system for modern power grids
EU project HyFlow: Over three years of research, the consortium of the EU project HyFlow has successfully developed a highly efficient, sustainable, and cost-effective hybrid energy storage system (HESS) that…
After 25 years, researchers uncover genetic cause of rare neurological disease
Some families call it a trial of faith. Others just call it a curse. The progressive neurological disease known as spinocerebellar ataxia 4 (SCA4) is a rare condition, but its…