Process to improve the properties of sputtered metal oxide layers
Metal oxide layers for semiconductor sensors or solar cells (e.g. tandem solar cells based on Cu2O) are usually produced by sputtering (HF or RF sputtering).
The novel method basically involves the controlled addition of hydrogen gas during the proper sputtering process. Thus, signif-icant improvements concerning the electrical properties of for example charge carrier concentration, charge carrier mobility and sheet resistance are achieved
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