Appliance for monitoring of etching activation
A novel appliance for monitoring of wet chemical etch activation was developed at Saarland University. A desired final point of the etch activation (etch stop) can be determined by continual measurement during the wet chemical structure activation. The method is suitable for any plane-parallel substrates which are optically transparent in at least one partition of the spectrum. In particular, the following substrates are of great interest: Si, GaAs, SiC, GaN, Ge, silicon and other III-IV semiconductors.
Further Information: PDF
Universität des Saarlandes Wissens- und Technologietransfer GmbH PatentVerwertungsAgentur der saarländischen Hochschulen
Phone: +49 (0)681/302-6340
Contact
Dipl. Chem. Dagmar Vössing, Dipl.-Kfm. Axel Koch MBA, Dipl. Ing. Gerd Schneider
Media Contact
All latest news from the category: Technology Offerings
Newest articles
Combatting disruptive ‘noise’ in quantum communication
In a significant milestone for quantum communication technology, an experiment has demonstrated how networks can be leveraged to combat disruptive ‘noise’ in quantum communications. The international effort led by researchers…
Stretchable quantum dot display
Intrinsically stretchable quantum dot-based light-emitting diodes achieved record-breaking performance. A team of South Korean scientists led by Professor KIM Dae-Hyeong of the Center for Nanoparticle Research within the Institute for…
Internet can achieve quantum speed with light saved as sound
Researchers at the University of Copenhagen’s Niels Bohr Institute have developed a new way to create quantum memory: A small drum can store data sent with light in its sonic…
