Fabrication of Nanometer Scale Patterns with Polymer Langmuir-Blodgett Films

The continuing trend toward higher circuit density in microelectronic devices has motivated research efforts in varieties of high-resolution lithography techniques, including electron beam (EB), X-ray, and deep UV irradiation. Use of ultra-thin films and new materials have been proposed as approaches to improve resolution in lithography. The Langmuir-Blodgett (LB) technique is very effective method used to prepare well-defined ultra-thin film with controlled thickness and orientation at a molecular level. Therefore, LB films are expected to realize ultra-high resolution photolithography [1-4].

In previous studies, [5-7] we have found that N-octadecylacrylamide forms a uniform LB film with a highly ordered structure, and yielded a fine negative pattern by photopolymerization. Furthermore, we have also succeeded in the preparation of preformed polymer LB film that has a cross-linking group [8]. By the cross-linking reaction with deep UV and electron beam irradiation we obtained a fine negative pattern consisting of two-dimensional network. All of these polymer LB films resulted in negative-tone photopatterns. On the other hand, we also obtained positive type photopatterns using poly(N-tetradecylmethacrylamide)(p(TDMA)) LB films without any development process (self-development) [9, 10]. It was found that the higher sensitivity could be obtained by changing the alkyl side chain to the short-branched type [11]. In addition, the deprotection reaction of t-butoxycarbonyloxy group has also been used in positive patterning of polymer LB films [12-14]. Combining these interesting properties, the improvement of not only the sensitivity but also the imaging quality can be expected. In this work, we prepared the copolymers of photodegradable N-tetradecylmethacrylamide (TDMA) with t-butyl 4-vinylphenyl carbonate (tBVPC) (Figure 1) aiming at the fabrication of a new type of positive resist taking place both main chain scission and polarity change caused by t-butoxycarbonyloxy group deprotection.

Media Contact

Dr. Ian Birkby EurekAlert!

All latest news from the category: Materials Sciences

Materials management deals with the research, development, manufacturing and processing of raw and industrial materials. Key aspects here are biological and medical issues, which play an increasingly important role in this field.

innovations-report offers in-depth articles related to the development and application of materials and the structure and properties of new materials.

Back to home

Comments (0)

Write a comment

Newest articles

Lighting up the future

New multidisciplinary research from the University of St Andrews could lead to more efficient televisions, computer screens and lighting. Researchers at the Organic Semiconductor Centre in the School of Physics and…

Researchers crack sugarcane’s complex genetic code

Sweet success: Scientists created a highly accurate reference genome for one of the most important modern crops and found a rare example of how genes confer disease resistance in plants….

Evolution of the most powerful ocean current on Earth

The Antarctic Circumpolar Current plays an important part in global overturning circulation, the exchange of heat and CO2 between the ocean and atmosphere, and the stability of Antarctica’s ice sheets….

Partners & Sponsors