When looking to produce the tiny semiconductor components used in electronic devices, photolithography is the process of choice. It not only provides high-resolution images, but also allows high-throughput production.
A scanning-electron micrograph of a test sample used to demonstrate a superlens's resolving power of better than 50 nanometers.
Copyright : 2012 A*STAR Institute of Materials Research and Engineering When looking to produce the tiny sem
However, as miniaturization of electronic circuits advances unceasingly, traditional photolithography hits both fundamental and cost limits. Now, a new photolithographic technique that will produce features smaller than those possible today is on the horizon.This development is thanks to an international research team led by Jing Hua Teng and Hong Liu from the A*STAR Institute of Materials Research and Engineering, Singapore, which included co-workers from the A*STAR Data Storage Institute, Singapore.
Liu, H., Wang, B., Ke, L., Deng, J., Choy, C. C. et al. High contrast superlens lithography engineered by loss reduction. Advanced Functional Materials 22, 3777–3783 (2012).
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