Method of Controlling Ion Energy and Flux in Capacitively Coupled Radio Frequency Discharges
The energy of ions impacting surfaces during plasma processing is crucial in determining both
the properties of materials being deposited by plasmas and for the control of the etching of thin films. A new method that allows the ion energy and plasma density to be decoupled has been developed.
Further Information: PDF
rubitec – Gesellschaft für Innovation und Technologie der Ruhr-Universität Bochum mbH
Phone: +49 (0)234/32-11969
Contact
Dietmar Tappe
Media Contact
All latest news from the category: Technology Offerings
Newest articles
Properties of new materials for microchips
… can now be measured well. Reseachers of Delft University of Technology demonstrated measuring performance properties of ultrathin silicon membranes. Making ever smaller and more powerful chips requires new ultrathin…
Floating solar’s potential
… to support sustainable development by addressing climate, water, and energy goals holistically. A new study published this week in Nature Energy raises the potential for floating solar photovoltaics (FPV)…
Skyrmions move at record speeds
… a step towards the computing of the future. An international research team led by scientists from the CNRS1 has discovered that the magnetic nanobubbles2 known as skyrmions can be…
