Advanced Thin Film Coatings by Surfactant Sputtering
Surfactant Sputtering constitutes a novel technology in the field of advanced thin films. Surfactant Sputtering is applicable for nanostructuring of thin films as well as for smoothing surfaces down to residual rms-roughness less than 0.1 nm.
Surfactant sputtering utilizes the steady state coverage of a substrate surface with foreign or self atoms simultaneously during sputter erosion by combined ion irradiation and atom deposition. These surfactant atoms (surface active agents) strongly modify the substrate sputter yield on atomic to macroscopic length scales. Depending on the surfactant–substrate combination, the novel technique allows enhanced smoothing of surfaces, the generation of novel surface patterns and nanostructures and the controlled shaping of surfaces on the nanometer scale.
Further Information: PDF
MBM ScienceBridge GmbH
Phone: (0551) 30724-152
Contact
Dr. Jens-Peter Horst
Media Contact
All latest news from the category: Technology Offerings
Newest articles
Superradiant atoms could push the boundaries of how precisely time can be measured
Superradiant atoms can help us measure time more precisely than ever. In a new study, researchers from the University of Copenhagen present a new method for measuring the time interval,…
Ion thermoelectric conversion devices for near room temperature
The electrode sheet of the thermoelectric device consists of ionic hydrogel, which is sandwiched between the electrodes to form, and the Prussian blue on the electrode undergoes a redox reaction…
Zap Energy achieves 37-million-degree temperatures in a compact device
New publication reports record electron temperatures for a small-scale, sheared-flow-stabilized Z-pinch fusion device. In the nine decades since humans first produced fusion reactions, only a few fusion technologies have demonstrated…
