Plasma is formed in both chambers of the two-chamber device, but potentials on the three electrodes between the chambers ensure that only electrons exit the left chamber, while positive ions are kept out. The positive beam is formed in the chamber on the left, and both beams are extracted by the accelerator column, far right.
An Imprinter that Combines Electron and Ion Beams Opens the Way for Wider Applications
An ion-beam system that simultaneously combines focused beams of electrons and positive ions promises to improve the versatility, efficiency, and economy of this important technology. The new system was developed by researchers at the Department of Energy’s Lawrence Berkeley National Laboratory, who report its principles and applications in the November 8, 2004 issue of Applied Physics Letters.
Focused ion beams are important in the semiconductor industry, where they are used to carve structures with dimensions measured in billionths of a meter, repair defects in masks used for photolithography, isolate and analyze elements of integrated circuits, "dope" semiconductors with specific atomic species, and perform other tasks.
Paul Preuss | EurekAlert!
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