Forum for Science, Industry and Business

Sponsored by:     3M 
Search our Site:

 

IMEC reduces cost of double patterning lithography

15.07.2008
IMEC, in collaboration with JSR Corporation, realized a simplified process using only one etch step to reduce the cost of double patterning.

32nm lines and spaces were printed with a double exposure/single etch process, effectively freezing the resist after the first exposure. This simplified process paves the way for an industrial take-up of double patterning for the 32nm technology node.

Double patterning will be the primary lithography candidate for the 32nm technology node. But when using two litho and two etch steps, this technique will be expensive and slow. Therefore, IMEC is developing alternative process flows that reduce the cost-of-ownership by eliminating the intermediate etch step and replacing it with a process step in the litho track.

One way to eliminate the extra etch step is through freezing the resist after the first exposure. With this technique, IMEC has demonstrated 32nm node logic patterning. The freezing material used to reach this result has been developed by JSR Corporation. It prevents the resist from expanding (i.e. CD growth) or shrinking. And when the second resist layer is added, the two do not interact. Also, the freezing material is compatible with the lithography hardware.

The step of freezing the resist is done in the litho track. After exposing the first pattern, the resist is coated with the freezing material. Next, the wafer is baked to freeze the resist. Then the excess freezing material is removed using a developer. In the following step, a second resist layer is added and the second exposure is done. To prevent the second resist layer solvent from washing away the first resist, the freezing material changes the properties of the first resist layer so that it becomes non-soluble in the second resist layer.

This technique allowed printing 32nm dense lines using dipole illumination at 1.0NA. CDU for the 44nm HP lines was excellent (3s = 2.4nm). Moreover, 32nm node 2D logic cells as well as 32nm dense lines could be etched into poly. Lines resulting from the first and second lithography step cannot be distinguished, illustrating the good resolution obtained with this technique.

IMEC is currently transferring this process to its newly installed 1.35 NA immersion scanner (ASML XT:1900i) to explore this solution for sub-32nm half pitches (towards 22nm node).

Katrien Marent | alfa
Further information:
http://www.imec.be
http://www.imec.be/wwwinter/mediacenter/en/doublepattSemWest.shtml

More articles from Physics and Astronomy:

nachricht Scientists propose synestia, a new type of planetary object
23.05.2017 | University of California - Davis

nachricht Turmoil in sluggish electrons’ existence
23.05.2017 | Max-Planck-Institut für Quantenoptik

All articles from Physics and Astronomy >>>

The most recent press releases about innovation >>>

Die letzten 5 Focus-News des innovations-reports im Überblick:

Im Focus: Turmoil in sluggish electrons’ existence

An international team of physicists has monitored the scattering behaviour of electrons in a non-conducting material in real-time. Their insights could be beneficial for radiotherapy.

We can refer to electrons in non-conducting materials as ‘sluggish’. Typically, they remain fixed in a location, deep inside an atomic composite. It is hence...

Im Focus: Wafer-thin Magnetic Materials Developed for Future Quantum Technologies

Two-dimensional magnetic structures are regarded as a promising material for new types of data storage, since the magnetic properties of individual molecular building blocks can be investigated and modified. For the first time, researchers have now produced a wafer-thin ferrimagnet, in which molecules with different magnetic centers arrange themselves on a gold surface to form a checkerboard pattern. Scientists at the Swiss Nanoscience Institute at the University of Basel and the Paul Scherrer Institute published their findings in the journal Nature Communications.

Ferrimagnets are composed of two centers which are magnetized at different strengths and point in opposing directions. Two-dimensional, quasi-flat ferrimagnets...

Im Focus: World's thinnest hologram paves path to new 3-D world

Nano-hologram paves way for integration of 3-D holography into everyday electronics

An Australian-Chinese research team has created the world's thinnest hologram, paving the way towards the integration of 3D holography into everyday...

Im Focus: Using graphene to create quantum bits

In the race to produce a quantum computer, a number of projects are seeking a way to create quantum bits -- or qubits -- that are stable, meaning they are not much affected by changes in their environment. This normally needs highly nonlinear non-dissipative elements capable of functioning at very low temperatures.

In pursuit of this goal, researchers at EPFL's Laboratory of Photonics and Quantum Measurements LPQM (STI/SB), have investigated a nonlinear graphene-based...

Im Focus: Bacteria harness the lotus effect to protect themselves

Biofilms: Researchers find the causes of water-repelling properties

Dental plaque and the viscous brown slime in drainpipes are two familiar examples of bacterial biofilms. Removing such bacterial depositions from surfaces is...

All Focus news of the innovation-report >>>

Anzeige

Anzeige

Event News

AWK Aachen Machine Tool Colloquium 2017: Internet of Production for Agile Enterprises

23.05.2017 | Event News

Dortmund MST Conference presents Individualized Healthcare Solutions with micro and nanotechnology

22.05.2017 | Event News

Innovation 4.0: Shaping a humane fourth industrial revolution

17.05.2017 | Event News

 
Latest News

Scientists propose synestia, a new type of planetary object

23.05.2017 | Physics and Astronomy

Zap! Graphene is bad news for bacteria

23.05.2017 | Life Sciences

Medical gamma-ray camera is now palm-sized

23.05.2017 | Medical Engineering

VideoLinks
B2B-VideoLinks
More VideoLinks >>>