Forum for Science, Industry and Business

Sponsored by:     3M 
Search our Site:

 

Distribution of Fraunhofer IISB Lithography Simulation Software

05.12.2007
Starting from 2008, Fraunhofer IISB will market its advanced and proven lithography simulation models and software algorithms in its development and research simulator Dr.LiTHO. The software can be purchased from Fraunhofer IISB. The cooperation with SIGMA-C, now part of Synopsys, will no longer be continued.

The Fraunhofer IISB lithography simulation software will be distributed as the Dr.LiTHO [1, 2] software package. Dr.LiTHO was formerly used as the internal development and research lithography simulator of Fraunhofer IISB and can now be purchased from this institute. This direct approach to market replaces the collaboration with SIGMA-C. Following the acquisition of SIGMA-C by Synopsys, Synopsys and Fraunhofer IISB could not reach a new agreement on the terms for continuing the cooperation.

The Munich-based software house SIGMA-C has been the sales partner for the simulation algorithms developed by Fraunhofer. As frequently published during this long-lasting cooperation between Fraunhofer IISB and SIGMA-C, important kernel algorithms of the established lithography simulators SOLID-C, SOLID-EUV, and SOLID-E were developed at Fraunhofer IISB. This, among others, includes FDTD [3] and the Waveguide Method [4] for the rigorous simulation of light diffraction from optical masks and extensions thereof for the modeling of EUV masks [3], for lithographic exposures over topography [5], and decomposition techniques for the fast rigorous simulation of larger mask areas [6].

The Fraunhofer software Dr.LiTHO includes revised and optimized versions of the Waveguide Method for the rigorous simulation of mask diffraction effects, mesoscopic models for the description of line edge roughness (LER), and several interfaces for the coupling of lithography simulation flows with external academic or commercial simulators, in addition to standard simulation models which were also included in SOLID-E.

Dr.LiTHO employs a user concept based on the modern programming language Python. This approach offers wide portability, various methods for parallelization, easy-to-use visualization components, and much more [1, 2]. Dr.LiTHO can be easily adapted to the modeling of alternative lithography techniques such as interference exposures, near field lithography, and/or contact and proximity printing. Optionally, Dr.LiTHO can be combined with the advanced optimization tools of Fraunhofer IISB [1]. Additional capabilities and interfaces will be added to Dr.LiTHO through future research and development.

In the future, the advanced lithography simulation algorithms of Fraunhofer IISB will also be combined and commercialized in combination with various simulation and metrology tools of academic research groups and commercial suppliers. New developments in the distribution of the IISB simulation software, including strategic alliances, will be published on our web site [1]

and on appropriate occasions elsewhere.

A user group will be established to support the industrial application and further development of Dr.LiTHO. Fraunhofer IISB will support members of this user group to adapt the simulation algorithms of Dr.LiTHO to their specific purpose. The requirements as defined by the user group will have a strong impact on the further development of Dr.LiTHO, both for "traditional applications" of lithography simulation in projection printing for semiconductor fabrication and for alternative lithographic technologies and areas of application.

The Fraunhofer IISB lithography simulation group has a long-standing history in lithography simulation. Almost 20 years ago Wolfgang Henke, at that time at Fraunhofer IMT, started to develop algorithms for the simulation of lithographic projection printing processes [7]. Today, the lithography simulation group of Fraunhofer IISB led by Andreas Erdmann employs 8 scientists and PhD students with various backgrounds in physics/optics, electrical engineering, and computer science.

[1] www.drlitho.com.
[2] T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann: "Dr.LiTHO - a development and research lithography simulator", Proc. SPIE 6520 (2007) 65203F-1
[3] A. Vial, A. Erdmann, T. Schmöller, and C.K. Kalus: "Modification of boundaries conditions in the FDTD algorithm for EUV masks modelling", Proc. SPIE 4754 (2002) 890
[4] A. Erdmann and P. Evanschitzky: "Rigorous mask modeling using waveguide and FDTD methods", SIGMA-C User Workshop Japan, 21. April, 2006
P. Evanschitzky and A. Erdmann: "Fast near field simulation of optical and EUV masks using the Waveguide Method", Proc. of SPIE 6533 (2007) 65530Y
[5] A. Erdmann, C.K. Kalus, T. Schmöller, Y. Klyonova, T. Sato, A. Endo, T. Shibata, and Y. Kobayashi: "Rigorous simulation of exposure over nonplanar wafers", Proc. SPIE 5040 (2003) 101
[6] A. Erdmann, C.K. Kalus, T. Schmöller, and A. Wolter: "Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques", Proc. SPIE 5037 (2003) 482

[7] W. Henke, R. Schwalm, M. Weiss, and J. Pelka: "Diffraction effects in submicron contact/proximity printing", Microelectronic Engineering 10 (1989)

Fraunhofer Institute of
Integrated Systems and
Device Technology (IISB)
Lithography Simulation
Dr. Andreas Erdmann
Phone +49 (0) 9131 761-258
Fax +49 (0) 9131 761-212
dr.litho@iisb.fraunhofer.de

Dr. Andreas Erdmann | Fraunhofer-Gesellschaft
Further information:
http://www.drlitho.com
http://www.iisb.fraunhofer.de

More articles from Information Technology:

nachricht Fingerprints of quantum entanglement
16.02.2018 | University of Vienna

nachricht Simple in the Cloud: The digitalization of brownfield systems made easy
07.02.2018 | Deutsches Forschungszentrum für Künstliche Intelligenz GmbH, DFKI

All articles from Information Technology >>>

The most recent press releases about innovation >>>

Die letzten 5 Focus-News des innovations-reports im Überblick:

Im Focus: Demonstration of a single molecule piezoelectric effect

Breakthrough provides a new concept of the design of molecular motors, sensors and electricity generators at nanoscale

Researchers from the Institute of Organic Chemistry and Biochemistry of the CAS (IOCB Prague), Institute of Physics of the CAS (IP CAS) and Palacký University...

Im Focus: Hybrid optics bring color imaging using ultrathin metalenses into focus

For photographers and scientists, lenses are lifesavers. They reflect and refract light, making possible the imaging systems that drive discovery through the microscope and preserve history through cameras.

But today's glass-based lenses are bulky and resist miniaturization. Next-generation technologies, such as ultrathin cameras or tiny microscopes, require...

Im Focus: Stem cell divisions in the adult brain seen for the first time

Scientists from the University of Zurich have succeeded for the first time in tracking individual stem cells and their neuronal progeny over months within the intact adult brain. This study sheds light on how new neurons are produced throughout life.

The generation of new nerve cells was once thought to taper off at the end of embryonic development. However, recent research has shown that the adult brain...

Im Focus: Interference as a new method for cooling quantum devices

Theoretical physicists propose to use negative interference to control heat flow in quantum devices. Study published in Physical Review Letters

Quantum computer parts are sensitive and need to be cooled to very low temperatures. Their tiny size makes them particularly susceptible to a temperature...

Im Focus: Autonomous 3D scanner supports individual manufacturing processes

Let’s say the armrest is broken in your vintage car. As things stand, you would need a lot of luck and persistence to find the right spare part. But in the world of Industrie 4.0 and production with batch sizes of one, you can simply scan the armrest and print it out. This is made possible by the first ever 3D scanner capable of working autonomously and in real time. The autonomous scanning system will be on display at the Hannover Messe Preview on February 6 and at the Hannover Messe proper from April 23 to 27, 2018 (Hall 6, Booth A30).

Part of the charm of vintage cars is that they stopped making them long ago, so it is special when you do see one out on the roads. If something breaks or...

All Focus news of the innovation-report >>>

Anzeige

Anzeige

VideoLinks
Industry & Economy
Event News

2nd International Conference on High Temperature Shape Memory Alloys (HTSMAs)

15.02.2018 | Event News

Aachen DC Grid Summit 2018

13.02.2018 | Event News

How Global Climate Policy Can Learn from the Energy Transition

12.02.2018 | Event News

 
Latest News

Fingerprints of quantum entanglement

16.02.2018 | Information Technology

'Living bandages': NUST MISIS scientists develop biocompatible anti-burn nanofibers

16.02.2018 | Health and Medicine

Hubble sees Neptune's mysterious shrinking storm

16.02.2018 | Physics and Astronomy

VideoLinks
Science & Research
Overview of more VideoLinks >>>