Forum for Science, Industry and Business

Sponsored by:     3M 
Search our Site:


Photoresists for 157nm Exposure Technology


Infineon Technologies (FSE/NYSE: IFX) and Clariant Corporation’s AZ Electronic Materials business (Somerville, N.J., USA) have signed an agreement to jointly develop photoresists for 157 nm exposure technology. The goal is to accelerate qualification of this technology for volume production.

The photoresist materials to be developed in this project will specifically enable Infineon to qualify the 157 nm technology for producing 55 nm structures in DRAM (dynamic random access memory) semiconductor chip production.

The International Technology Roadmap for Semiconductors, which describes the technology and materials needed for future chip generations, predicts that 55 nm structures will be in volume production beginning in 2007. One of the mainstream candidate technologies for achieving these dimensions is 157 nm lithography, a technology that uses fluorine molecular lasers emitting at the vacuum ultraviolet wavelength of 157 nm.

To accelerate the photoresist development work, the companies will draw upon their joint chemical research and development capabilities and use Infineon’s most advanced lithographic equipment in Dresden, Germany. Infineon will have one of the earliest exposure tools available for 157 nm pilot production. Wilhelm Beinvogl, Infineon’s chief technology officer for memory products, says early access to such a tool is integral to accelerating the material and process development.

“Because of the research and development capabilities and advanced processing equipment that this development project brings together, our companies are confident we can help make 157 nm photoresist available for the timely introduction of the 55 nm node,” says Clariant’s Dr. Ralph Dammel, director of technology for 193 nm and 157 nm products.

Photoresists are light-sensitive materials that define the small patterns on the various layers of an integrated circuit. Lithographic technologies have evolved rapidly over the past few decades. Currently lithography at the 193 nm wavelength of light is entering volume production. The 193 nm wavelength has been introduced at Infineon to define sub-130 nm patterns. The157 nm wavelength is predicted to be the final usable optical wavelength. It is also predicted that non-optical “Next Generation Lithography” methods will be needed to produce even smaller structures. The 157 nm technology bridges the gap between 193 nm and Next Generation Lithography.

About Clariant AZ Electronic Materials

The AZ Electronic Materials business of Clariant is a worldwide leader in electronic materials for the semiconductor, recording head, and flat panel display markets. Clariant AZ Electronic Materials provides a total customer solution with a broad line of photoresists, antireflective coatings, developers, ancillary chemicals, dielectric materials, and polyimides. Clariant is a global leader in the production of fine and specialty chemicals with some 29,000 employees and annual sales of about CHF 10 billion. The Group operates worldwide with more than 100 companies on five continents. It is domiciled and headquartered in Muttenz near Basel/Switzerland. The products and services of the five divisions Textile, Leather & Paper Chemicals, Pigments & Additives, Masterbatches, Functional Chemicals and Life Science & Electronic Chemicals are based on innovative specialty chemicals. These play a decisive role in the clients’ manufacturing processes and upgrade their end products.

About Infineon

Infineon Technologies AG, Munich, Germany, offers semiconductor and system solutions for the automotive and industrial sectors, for applications in the wired communications markets, secure mobile solutions as well as memory products. With a global presence, Infineon operates in the US from San Jose, CA, in the Asia-Pacific region from Singapore and in Japan from Tokyo. In fiscal year 2002 (ending September), the company achieved sales of Euro 5.21 billion with about 30,400 employees worldwide. Infineon is listed on the DAX index of the Frankfurt Stock Exchange and on the New York Stock Exchange (ticker symbol: IFX).

Contacts at Clariant
157 nm Technology Contact
Dr. Ralph Dammel

Reiner Schoenrock | Infineon Technologies AG
Further information:

More articles from Information Technology:

nachricht TIB’s Visual Analytics Research Group to develop methods for person detection and visualisation
19.03.2018 | Technische Informationsbibliothek (TIB)

nachricht Green Light for Galaxy Europe
15.03.2018 | Albert-Ludwigs-Universität Freiburg im Breisgau

All articles from Information Technology >>>

The most recent press releases about innovation >>>

Die letzten 5 Focus-News des innovations-reports im Überblick:

Im Focus: Tiny implants for cells are functional in vivo

For the first time, an interdisciplinary team from the University of Basel has succeeded in integrating artificial organelles into the cells of live zebrafish embryos. This innovative approach using artificial organelles as cellular implants offers new potential in treating a range of diseases, as the authors report in an article published in Nature Communications.

In the cells of higher organisms, organelles such as the nucleus or mitochondria perform a range of complex functions necessary for life. In the networks of...

Im Focus: Locomotion control with photopigments

Researchers from Göttingen University discover additional function of opsins

Animal photoreceptors capture light with photopigments. Researchers from the University of Göttingen have now discovered that these photopigments fulfill an...

Im Focus: Surveying the Arctic: Tracking down carbon particles

Researchers embark on aerial campaign over Northeast Greenland

On 15 March, the AWI research aeroplane Polar 5 will depart for Greenland. Concentrating on the furthest northeast region of the island, an international team...

Im Focus: Unique Insights into the Antarctic Ice Shelf System

Data collected on ocean-ice interactions in the little-researched regions of the far south

The world’s second-largest ice shelf was the destination for a Polarstern expedition that ended in Punta Arenas, Chile on 14th March 2018. Oceanographers from...

Im Focus: ILA 2018: Laser alternative to hexavalent chromium coating

At the 2018 ILA Berlin Air Show from April 25–29, the Fraunhofer Institute for Laser Technology ILT is showcasing extreme high-speed Laser Material Deposition (EHLA): A video documents how for metal components that are highly loaded, EHLA has already proved itself as an alternative to hard chrome plating, which is now allowed only under special conditions.

When the EU restricted the use of hexavalent chromium compounds to special applications requiring authorization, the move prompted a rethink in the surface...

All Focus news of the innovation-report >>>



Industry & Economy
Event News

Virtual reality conference comes to Reutlingen

19.03.2018 | Event News

Ultrafast Wireless and Chip Design at the DATE Conference in Dresden

16.03.2018 | Event News

International Tinnitus Conference of the Tinnitus Research Initiative in Regensburg

13.03.2018 | Event News

Latest News

A new kind of quantum bits in two dimensions

19.03.2018 | Physics and Astronomy

Scientists have a new way to gauge the growth of nanowires

19.03.2018 | Materials Sciences

Virtual reality conference comes to Reutlingen

19.03.2018 | Event News

Science & Research
Overview of more VideoLinks >>>