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The International Conference on Plasma Nanotechnology and Science IC-PLANTS 2011

28.02.2011
The 4th IC-PLANTS is to be held at the Takayama Public Cultural Hall, Takayama JAPAN.

Plasma processing technologies are the state of the art technologies leading the way through ultra-high performance in Nano-materials, microelectronic devices, flat panels, etc..

IC-PLANTS is organized for offer an opportunity for discussions and exchange of recent progress of Plasma Science and Nanotechnology among the Plasma CoEs in the world. It is absolutely necessary to collaborate between the research communities for clearing the complex issues in the interdisciplinary research fields.

Themes:

Plasma Nanotechnology
Atmospheric pressure plasma and biotechnologies
Topics:
Nano-fabrication
Interactions between plasmas and nano-interfaces
Diagnostics and monitoring of plasmas and Reaction surfaces
Nano-electronics
Nano-biology
Interdisciplinary or integrated research with Plasma technologies
Nano-optics
MEMS NEMS technologies
Process technologies for flat panel display
Environmental technologies
Equipment technologies
Emerging new concept
Associated websites:
IC-PLANTS 2011 homepage:
http://www.plasma.engg.nagoya-u.ac.jp/IC-2011/index.html
Announcement on NanotechJapan:
https://nanonet.nims.go.jp/english/modules/calendar/index.php?smode=Monthly&action=View&event_id=0000001348&caldate=2011-3-10

Mikiko Tanifuji | Research asia research news
Further information:
http://www.researchsea.com/html/calendar.php/eml/1/eid/5925/cid/2
http://www.researchsea.com

Further reports about: IC-PLANTS Nanotechnology Plasma technology

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